Laboratory Participation and Competency: (20%)
Student participation and demonstration of competency in the clean room laboratory is an important component of the course. This part of the grade will be a qualitative judgment of a student's ability to work in the clean room environment, and it will be measured by a combination of attendance, laboratory notebook participation, and overall demonstration of good laboratory practice, including safety, understanding of machine and chemical characteristics and protocols, and demonstrated ability to perform the common procedures of microfabrication.
Laboratory Sections - Winter 2014
Section AA: Monday, 1:30 - 4:20pm
Section AB: Tuesday, 1:30 - 4:20pm
Section AC: Wednesday, 1:30 - 4:20pm
Section AD: Thursday, 1:30 - 4:20pm
This Winter quarter there are two Monday holidays which will interfere with the laboratory schedule: Martin Luther King Jr. Holiday on Monday, Jan. 21, and President's Day Holiday on Monday, Feb. 18. There will be no lecture or laboratory held on those days. Students in the Monday AA section will need to modify their schedule and distribute themselves into the other three sections on those weeks. Please plan ahead for this!
Meeting Location
Although the UW time schedule shows the room location for EE-527 as the EE MicroFab Lab (EE-MFL) in room B025 of EEB, the laboratories will meet in the Fluke Hall Washington Nanofabrication Facility (WNF). Because students are not yet qualified users of the WNF, students in EE-527 must be escorted into and through the WNF by staff or the instructor or the TA. For each week's laboratory work, meet outside the Bowen Conference Room on the First Floor of Fluke Hall, just inside the North Entrance by the elevator. Please be there by 1:30pm sharp, since someone being late will delay the whole group. If you cannot attend the laboratory for some last minute reason, then please let someone else in the laboratory group know this, so we will not be left waiting for you!
The quick info sheet at the top of this page contains a map to help get you there.
Proper Attire
Users of the Fluke Hall WNF are required to wear clean room suits and suitable clothing must be worn to work with these. No open-toed shoes or sandals are allowed; shoes with good traction such as cross-trainers are preferred. Arms and legs should be covered; shorts and skirts are not allowed. Baggy and bulky clothing which restricts movement is discouraged. The best clothes are light weight natural fiber materials which allow good ventilation, are close fitting, and do not restrict movement. Two pairs of clean room gloves will be worn, so all rings and bracelets must come off prior to entering the clean room. Fingernails should be clipped short to avoid tearing the gloves. Users with long hair should bring something to tie it back with. If you wish to use your own eyeglasses as safety glasses, they need to be sufficiently big to protect your eyes and they should be impact resistant. Contact lenses are OK, but safety glasses must still be worn.
Organization
Each student will be given one 4-inch silicon wafer to fabricate with. It will be their souvenir to keep after the course is over. While most of the fabrication steps on that wafer will be performed individually by the student, there will be several steps in which all of the class wafers will be processed together as a batch. Batch processes include oxidation and diffusion in the furnace tubes, as two examples. Batch processes will be performed by a subset of the students in the class or by WNF staff. When students are processing their wafers individually, the entire lab group may complete the process in sequence, one-by-one before moving on to the next step in the process. Alternatively, they may be moving from one tool to another during the same laboratory session so that the lab group can accomplish several steps in the process more efficiently. Once they are finished with one tool, that same tool will then get used by the next student in the queue, forming a continuous pipeline through the process. Each step in the fabrication process flow can thus be categorized by how it gets carried out:
- Individual, group sequence
- Individual, pipelined
- Batch, student run
- Batch, staff run
If the overall progress through the process flow gets delayed, some of the individual steps may be converted into batch steps to save time and get the process completed by the end of the quarter.
Laboratory Schedule - Winter 2014
Printer friendly PDF version of the Winter 2014 Laboratory Schedule
Week 1: January 6 – 9 (Mon. – Thurs.)
Introduction to the Fluke Hall Washington Nanofabrication Facility (WNF), safety, gowning, and laboratory walk-through. This will include a half-hour safety video, gowning instruction, and introduction to the Coral equipment use system.
Process steps 0 and 1: Distribution of new wafers. Initial RCA1 and RCA2 cleaning of starting wafers along with BOE residual oxide strip.
Week 2: January 13 – 16 (Mon. – Thurs.)
Process steps 2, 3, and 4: Photolithography for mask 1 (Alignment Marks). Alignment mark silicon dry etch with SF6. Strip photoresist and clean wafers to be ready for the wet thermal oxide growth. Students will prepare their own wafers during normal laboratory sessions on Monday – Thursday.
Week 2: January 17 (Fri.)
Process step 5: All of the wafers will be run through the oxidation furnace at once on Friday. Students can come by to watch if they would like.
Week 3: January 20 (Mon.) MLKJr Holiday
Week 3: January 21 – 23 (Tues. – Thurs.)
Process steps 6, 7, and 8: Photolithography for mask 2 (P-Diffusion). This is the first photolithography that involves alignment, so it may take longer. Thermal oxide dry etch. Strip photoresist and clean wafers.
Week 4: January 27 – 30 (Mon. – Thurs.)
Process step 9: Spin on and pre-bake of boron SOD. Students will prepare their own wafers through the annealing of the SOD.
Week 4: January 31 (Fri.)
Process step 10: Boron diffusion. All of the wafers will be run through the diffusion furnace at once on Wednesday. Students can come by to watch if they would like.
Process step 11: Wet HF clean up etch of boron diffusion.
Week 5: February 03 – 06 (Mon. – Thurs.)
Process steps 12 and 13: PECVD deposition of replacement oxide layer. Photolithography for mask 3 (N-Diffusion). Both the PECVD and photolithography systems will be running simultaneously to allow pipelining of student wafers each day.
Week 6: February 10 – 13 (Mon. – Thurs.)
Process steps 14, 15, and 16: Oxide etch. Photoresist stripping and wafer cleaning. Spin on and annealing of phosphorous SOD. Students will prepare their own wafers through the annealing of the SOD on Monday – Tuesday.
Week 6: February 14 (Fri.)
Process step 17: Phosphorous diffusion. All of the wafers will be run through the diffusion furnace at once on Wednesday. Students can come by to watch if they would like.
Week 7: February 17 (Mon.) President’s Day Holiday
Week 7: February 18 – 20 (Tues. – Thurs.)
Process step 18: Wet BOE clean up etch of phosphorous diffusion and removal of all remaining oxide layers. All of the wafers are run as a batch to be ready for the field oxidation.
Week 7: February 21 (Fri.)
Process step 19: Field oxidation. All of the wafers will be run through the oxidation furnace at once on Friday. Students can come by to watch if they would like.
Week 8: February 24 – 27 (Mon. – Thurs.)
Process steps 20, 21, and 22: Photolithography for mask 4 (Active). Dry etch of SiO2 for active region definition. Photoresist stripping and wafer cleaning. Each student prepares their own wafer through the stripping and cleaning, ready for the gate oxidation.
Week 8: February 28 (Fri.)
Process step 23: Gate oxidation. All of the wafers will be run through the oxidation furnace at once on Friday. Students can come by to watch if they would like.
Week 9: March 03 – 06 (Mon. – Thurs.)
Process steps 24, 25, and 26: Photolithography for mask 5 (Contact). Dry etch of SiO2 for contact holes. Stripping of photoresist and clean-up of wafers.
Week 10: March 10 – 13 (Mon. – Thurs.)
Process steps 27 and 28: Photolithography for mask 6 (Metal1). Electron beam deposition of Al/Cr metal1. Each student prepares their own wafer ready for metallization. At the end of the day, all of the day’s wafers will be evaporated together. Each metallization run will thus be 4-5 wafers only. This will be a long, but most of the time is pump down time and the students can leave for a few hours while the chamber is pumping down and return later to perform the evaporation.
Finals Week: March 17 – 21 (Mon. – Fri.)
Process steps 29 and 30: Metal1 lift-off. Metal1 annealing. All of the wafers can be processed together as a batch. Some initial electrical tests can also be made. Most likely, any electrical testing will be pushed into finals week.
Laboratory Process Flow - Winter 2014
Printer friendly PDF version of the Winter 2014 Laboratory Process Flow
Fluke Hall Washington Nanofabrication Facility (WNF) User Access for EE-527 Students
Students registered for EE-527 will need to go through the normal access procedures for the Fluke Hall Washington Nanofabrication Facility (WNF). Because students have not yet been checked out for using the lab or its equipment, they must still be escorted into and through the WNF by the instructor, TA, or staff. By completing these items below, students completing EE-527 will have less to do when they want to run their first project through the WNF.
First, bookmark the home page for the Washington Nanofabrication Facility:
https://www.wnf.washington.edu/
Second, set up a user account in Coral:
From the WNF home page, click on Start a New Project in the center of the page. Next, click on the WNF new user site, which will start a three-step process for setting up the Coral user account. Log in with your UW NetID, and then enter the following information for the EE-527 course:
Are you the principal investigator? No.
If not, select your PI: Tai Chen
Research Goals: completing EE-527
continue to page 2
Research Proposal: completing EE-527
continue to page 3
Primary Research Funding: University Funds
complete Technical Field and Position
Type of Research: Educational Lab Use
complete Name as it appears in publications
Institution Name: University of Washington
Institution Type: University of Washington
complete Academic Department
City: Seattle
State: WA
Postal Code: 98195
Primary NNIN Site: U of Washington
Fill in all of the Billing Information as N/A
Complete the demographic information and submit the application.
Third, complete the on-line EH&S safety training:
The Environmental Health & Safety (EH&S) on-line course "Managing Laboratory Chemicals" can be found at:
https://www.ehs.washington.edu/secure/train/labchem/index.shtm
Click on the link, login with your UW NetID, and follow the steps to complete the training.
On the certification form at the end of the training, please enter "WNF Safety Committee" as your supervisor's name, and mff-safety@engr.washington.edu as your supervisor's email address.
The employee number or student number is the number on the front of your Husky Card.
An email will be sent to you and the safety committee. This email is certification that you completed the training course. Keep a copy of this email for your records.
For questions concerning access to the WNF, contact Darick Baker: darick@uw.edu
Fourth, complete the WNF Cleanroom Operations on-line quiz:
The WNF Cleanroom Operations Quiz is found on Catalyst:
https://catalyst.uw.edu/webq/survey/bojko/174943
The link to the quiz and the WNF Lab User Manual and its Addendum can also be found in the WNF Documents and Resources box of the WNF home page. You should read through the Lab User Manual and the Addendum before taking the quiz.
The quiz is "Open Book." You may refer to the lab user manual and its posted updates when completing the quiz. You must answer all of the questions correctly in order to maintain access to the WNF Cleanroom. When you have successfully completed the quiz, you are finished with the required qualifications. It is expected that you will abide by all of the points covered in the WNF Lab User Manual, so this should be regarded as important protocol, not merely a perfunctory check box!
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