Equipment and Facilities
Since research into nm-scale materials is multidisciplinary many shared facilities are utilized. This gives students a great opportunity to learn about many techniques as well as flexibility in research directions
Within the group laboratory there is
electrochemical station, membrane transport equipment
Schlink line and standard synthetic chemistry equipment
2-zone tube furnace and CVD growth
Low temperature with applied magnetic field transport measurement station
Probe Station, AFM, Wire Bonder, Vacuum Oven, spin coater, UV-vis, Student Computers, membrane characterization systems
Shared micro/nano-fabrication facility
Center for Nanoscale Science and Engineering (CeNSE)
Class 100 clean room
Wafer cleaning station
Spin coating station
4 furnace bank of 3-zone Lindberge/Blue oxidation and dopant diffusion furnaces
Karl Suss MJB3 photolithography alignment station
Sloan 1A profilometer
Gaertner 117A ellipsometer
Plasma enhanced Chemical Vapor Deposition system (TekVac PECVD-60-R)
Plasmatic reactive ion etching station
Technice ion beam etching
Torr International E-beam evaporation with crystal quartz monitor
Edwards FL 400 Thermal evaporation with crystal quartz monitor
Five target sputter deposition
Materials Characterization
SEM, TEM, AFM, XRD with UK's Electron Microscope Facility
Chemical Characterization
Utilize the shared facilities of the Chemistry Department, Environment Research Training Laboratory