Photo-Stimulated Desorption of Xenon Atoms from Oxidized Silicon Surfaces

Fernando D. Vila and Hannes Jonsson

Department of Chemistry, University of Washington, Seattle, WA 98195.

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Xe...SiO2
Introduction

In recent experiments carried out by Watanabe and Matsumoto[1] xenon atoms adsorbed on modified and unmodified silicon surfaces were irradiated with photons of variable energy (1.16-6.43 eV). The resulting time-of-flight spectra of the desorbed atoms show two velocity components: a slow one centered around 0.25 eV and a fast one around 0.85 eV. The slow component appears over the complete excitation energy range and has been assigned to the energy transfer between local phonon excitations and the adsorbed atoms.[2] The fast component appears only for modified (oxidized) surfaces when the energy is >3.5 eV. Its origin, however, is less well understood. Watanabe and Matsumoto have proposed a mechanism in which an electron is transferred from a Xenon atom to the surface, placing the system in the first (charge-transfer) state.
The system subsequently evolves in this state and the positively charged atom is attracted to the negative surface until the system returns to the ground state. If the evolution time is sufficiently long and since the excited state potential is expected to be much more attractive than the ground state, the system returns to the ground state in a highly repulsive region, providing the atom with sufficient energy to desorbe. This mechanism is summarized in the following diagram:

Desorption Mechanism Diagram

The limit energy for the charge-transfer state corresponds to the difference between the ionization energy of the Xe atom (12.12 eV) and the electron affinity of the surface. Since the oxidation state of the surface is not completely know, this energy can not determined and the authors equate it to the work function of silicon (4.6 eV). With this assumption, the charge-transfer state is lowered sufficiently bringing it within the range of the experimental excitation energies.

Our group has been recently studying the formation and localization of Self-Trapped Excitons (STE) in quartz, and the energy transfer between them and adsorbed atoms. The energy required to form a STE in SiO2 is about 3.0 eV, in good agreement with the energy threshold observed by Watanabe and Matsumoto. Moreover, the exciton is observed to evolve towards the surface where a dangling bond pushes the adsorbed atoms away. In light of these results we have decided to carry out calculations to assess the feasibility of the charge-transfer mechanism in the case of xenon atoms adsorbed on quartz.

We have used the CASSCF and CASPT2 methods to model the ground and excited (charge-transfer) state interaction between a xenon atom and the quartz surface. This surface was represented by the cluster model shown in Fig. 1. The active space chosen was the minimal required to accurately describe the states involved and, to ensure the accuracy of the CASSCF results, two basis set schemes were used. Both basis sets were augmented with diffuse functions to accurately represent the anionic state of the surface.
SiO2 Model
 
Figure 1: Cluster model used to represent the quartz surface. The unsaturated oxygen atoms are capped with hydrogen atoms (not shown).


Results

Fig. 2 presents the CASSCF and CASPT2 potential energy curves (PEC's) for the interaction between a xenon atom and the quartz surface. As expected, the minima in the PEC's are shifted to shorter interaction distances when electron correlation is included. This results from the better description of the dispersion energy proivided by the CASPT2 method. The energy required to access the excited state PEC is 8.51 eV at CASPT2 level (8.97 eV at CASSCF level), far greater than the experimentally observed threshold.


Potential Energy Curves

Figure 2: CASSCF and CASPT2 potential energy curves for the ground and charge-transfer state of Xe...SiO2. The arrows indicate the presence of a local minimum.


This is a consequence of two different factors: First, the electron affinity of the surface is negligible, providing no stabilization upon charge-transfer. Second, the very diffuse nature of the transferred electron reduces the electrostatic interaction energy, raising the position of the minimum in the excited state. These results clearly show that the mechanism proposed by Watanabe and Matsumoto can not be applied to a quartz surface.

References
  1. K. Watanabe and Y. Matsumoto, Faraday Discuss. 117 (2000) 203.
  2. K. Watanabe, H. Kato and Y. Matsumoto, Surface Science  446 (2000) L134.


Fernando Vila, fdv@u.washington.edu